Rapid Thermal Annealing System
The Ants Rapid Thermal Annealing System Furnace is engineered for precise, high-speed thermal treatments of semiconductor wafers and other advanced materials. With ramp rates up to 20°C/sec and tightly controlled process environments, this system is ideal for dopant activation, silicide formation, oxidation, and thin-film crystallization.
Unlike conventional furnaces, the RTA system uses infrared or halogen lamps for instant and uniform heating reaching temperatures over 1000°C within seconds while minimizing thermal diffusion. Its low thermal budget makes it the go-to solution for microelectronics research and high-speed annealing tasks in cleanroom and R&D settings.
- Rapid heat-up & cool-down cycles for tight thermal control
- Enables dopant activation, surface modification, and thin-film treatment
- Preserves structural integrity of delicate substrates
- Suitable for lab-scale fabrication and prototype development
- Rapid heat-up & cool-down cycles for tight thermal control
- Enables dopant activation, surface modification, and thin-film treatment
- Preserves structural integrity of delicate substrates
- Suitable for lab-scale fabrication and prototype development
